CH ENGR 236

Chemical Vapor Deposition

Description: Lecture, four hours; outside study, eight hours. Requisites: courses 210, C216. Chemical vapor deposition is widely used to deposit thin films that comprise microelectronic devices. Topics include reactor design, transport phenomena, gas and surface chemical kinetics, structure and composition of deposited films, and relationship between process conditions and film properties. Letter grading.

Units: 4.0
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