CH ENGR 234

Plasma Chemistry and Engineering

Description: Lecture, four hours; outside study, eight hours. Designed for graduate chemistry or engineering students. Application of chemistry, physics, and engineering principles to design and operation of plasma and ion-beam reactors used in etching, deposition, oxidation, and cleaning of materials. Examination of atomic, molecular, and ionic phenomena involved in plasma and ion-beam processing of semiconductors, etc. Letter grading.

Units: 4.0
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